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Home > Quality > Environmental Programs > Environmental Health & Safety"ON Semiconductor is dedicated to providing a safe and healthful workplace and to preserving our environment for future generations."We know that operating responsibly is vital to our business. Our EHS Management System allows us to plan, manage, and continuously improve our operations in order to live up to our EHS Policy. Download our Product Chemical Content Brochure including Material Declaration. Search for product packages compositions on Material Composition page. ON Semiconductor Corporation - ISO 14001 CertificationContinued compliance with and certification to ISO 14001 provides ON Semiconductor with a competitive advantage as it uses its flexible manufacturing network to meet the needs of customers around the world. To view ISO14001 certificates for ON Semiconductor's various manufacturing locations, click to Certifications and Qualified Sites Chart . Pollution PreventionPiestany Site Reduces Chemical and DI Water Consumption with Ozone Tool PIESTANY, Slovak Republic - ON Semiconductor Piestany facility reduced the use of sulfuric acid, hydrogen peroxide, and DI Water by installing a new ozone photoresist striping process. Ozone directly oxidizes the carbon hydrogen bond. Advantages of the ozone process compared to the acid wet bench method include: higher stripping efficiency; smaller tool footprint; simpler wafer handling; lower chemical and water consumption and less air pollution. The new method saved 18,000 liters per year in chemicals and 2.8 million liters per year in DI water. Phoenix Site Implements Water Conservation By Reclaim and Reuse of Rinse Wastewater PHOENIX, Ariz - ON Semiconductor Phoenix facility has currently installed a rinse wastewater reuse system that saves about 37 million gallons of city water use in its operations annually. This rinse wastewater reclaim system captures, segregates, treats and reuses primary and secondary rinse wastewaters from the selected wet tools used in wafer fabrication processes. The reclaimed rinse waste water is currently used in acid fume scrubbers replacing the city water. The selected rinse wastewater from many wafer fabrication processes has the most cost-effective recycle potential with its water quality better than the city water, in many aspects. As a part of our long term water conservation strategy, additional wet tools, and spin rinse dryers will be connected to the water reclaim system and the reclaimed wastewater will be sent to the facilities’ main RODI treatment system to produce high purity water for its manufacturing operations. Use of this rinse reclaimed wastewater in RODI system will generate additional benefits in reduced chemical use, higher RO (Reverse Osmosis) system efficiency and reduced cleaning of the membranes due to lower hardness and trace ionic impurities. Reduced water usage also helps reduce the wastewater treatment cost, reduced sewage flow and cost. Industrial sewer cost is almost equal to the fresh water cost in Arizona. With water conservation, we reduce the environmental impact while achieving a good return on investment. ON Semiconductor Phoenix Facility Participates in South Phoenix Industry Challenge/Good Neighbor Partnership (ICGN) Program PHOENIX, Ariz – The Phoenix facility of ON Semiconductor, as a part of the larger community, and a good corporate citizen, volunteered to participate in South Phoenix Multi-Media Toxics Reduction Project, initiated by the Arizona Department of Environmental Quality through a grant from the U.S. Environmental Protection Agency. The goal of the Toxic Reduction initiative is to work with local stakeholders to identify and implement strategies to reduce toxic pollutants in South Phoenix. ON Semiconductor is committed to the mission of the Industry Challenge/Good Neighbor Partnership (ICGN) in reducing emissions of hazardous air pollutants and decreasing accidental releases in the South Phoenix community. Our Phoenix facility reported a reduction of 52% in energy use, and 48%, 58% and 90% reduction in HCl, HF and sulfuric acid emissions respectively, in the year 2007, indexed to production, over the baseline year of 2003. These reductions are achieved by implementing many electricity and chemical use reduction projects in manufacturing and facilities operations.
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