Enabling Energy Efficient Solutions

Product Overview

C3/D3: 0.35 µm Process Technology

Product Description
The C3/D3 process family from ON Semiconductor is an ideal 0.35 µm low cost solution to mixed-signal designs requiring a moderate amount of digital logic (up to 250 k gates). Optimized for 3.3 V operation with added devices for 5 V capability, high-performance, low-power, and mixed-signal digital libraries, and mixed-signal features such as poly-poly capacitors, Schottky diodes, and high resistivity poly. C3/D3 provides the flexibility to implement a variety of mixed-signal applications.

Features

  • 3 to 5 metal layers
  • Poly to poly capacitors
  • Schottky diodes
  • High-resistance poly
  • Salicide process with optional blocking
  • 5 V devices (thick gate oxide)
  • 5 V tolerant I/O in normal process

Process Characteristics

Operating Voltage 3.3 V, 5 V
Substrate Material P-Type, EPI
Drawn Transistor Length 0.35 µm
Gate Oxide Thickness 7.0 nm/11.0 nm
Contact/Via Size 0.4 µm/0.5 µm
Top Metal Thickness 675 nm
Contacted Metal Pitch
   Metal 1 1.1 µm
   Metal 2-5 1.2 µm
Metal Composition AI/TiN

Sample Process Options

  Mask Layers
1 poly, 3 metal 16
1 poly, 5 metal 20
2 poly, 3 metal, Hi-R poly 20
2 poly, 5 metal, Hi-R poly 24

Device Characteristics

(All Values Typical at 25°C)

Transistors

N-Channel Typical Value Unit
Vt 0.5 V
Idsat 510 µA/µm

P-Channel Typical Value Unit
Vt -0.554 V
Idsat -259 µA/µm

Thick Gate Transistors

N-Channel Typical Value Unit
Vt 0.76 V
Idsat 470 µA/µm

P-Channel Typical Value Unit
Vt -0.95 V
Idsat -240 µA/µm
 

Resistors

  Typical Value Unit
Poly 10 Ω/square
Hi-R Poly 1000 Ω/square
N-Diffusion 10 Ω/square
P-Diffusion 10 Ω/square
N-Well 1250 Ω/square

Capacitors

  Typical Value Unit
Poly-Poly 0.9 fF/µm²

Diodes

Schottky Diode Typical Value Unit
Area 5.1 µm²
Id (Vf = 0.1 V) 0.05 µA
Id (Vf = 0.3 V) 2 µA
Id (Vf = 0.6 V) 175 µA

Libraries
(All values typical at 3.3 V, 25°C)

Standard Cell
Ultra High Density Core Cell
pn sum: 2.0
Area of 2-input nand (na21): 38.88 µm
Gate density (na21 @ 100% utilization): 25.72 k gates/mm²
Scan Flop density (scan flops @100% utilization): 3.215 k ff/mm²
Average power (@ 3.3 V): 0.604852 µW/MHz/gate
Mixed-Signal Core Cell – Separate substrate for reduced noise
pn sum: 4.5
Area of 2-input nand (na21): 74.88 µm
Gate density (na21 @ 100% utilization): 13.35 k gates/mm²
Scan Flop density (scan flops @100% utilization): 1.842 k ff/mm²
Average power (@ 3.3 V): 0.6074 µW/MHz/gate
5 V Capable Core Cell – Thick gate logic design
pn sum: 5.0
Area of 2-input nand (na21): 108 µm²
Gate density (na21 @ 100% utilization): 9.259 k gates/mm²
Scan Flop density (scan flops @100% utilization): 1.187 k ff/mm²
Average power (@ 5.0 V): 3.0553 µW/MHz/gate
Core Cell Level Shifters
Bidirectional: 2 cells, pad high to core low, or pad low to core high
Unidirectional: 1 cell optimized for speed, pad high to core low

Standard I/O
Fat Pad I/O Library (for core limited designs)
135 µm max in-line pad pitch
459.15 µm pad height
Tall Pad I/O Library (for pad limited designs)
86 µm max in-line pad pitch
730 µm pad height
5 V Capable I/O Library – Thick gate logic design
140.40 µm max in-line pad pitch
274.05 µm pad height

Memory Options

RAM
Asynchronous Single Port SRAM*
35 µm²/bit (64 k bit memory)
Asynchronous Dual Port SRAM*
64 µm²/bit (64 k bit memory)

ROM
Asynchronous Diffusion ROM*
5.4 µm²/bit (64 k bit memory)
* Compiled

Non-Volatile Memory
EEPROM
Differential Bit Cell (Redundancy for High Reliability)
2 ms Write
Array: up to 1 k Bits (32x32), Vector: up to 32 bits (1x32)
Internal Charge Pump provided

CAD Tool Compatibility

Digital Design
Synopsys Design Compiler
Cadence Verilog

Analog Design
Cadence DFII (4.4.6)
Spectre

Place and Route
Synopsys Apollo, Astro
Cadence Silicon Ensemble

Physical Verification
Mentor Calibre

For more information please contact your local sales support at www.onsemi.com